Method of fabricating a scalable nanoporous membrane filter
Patent
·
OSTI ID:1092759
A method of fabricating a nanoporous membrane filter having a uniform array of nanopores etch-formed in a thin film structure (e.g. (100)-oriented single crystal silicon) having a predetermined thickness, by (a) using interferometric lithography to create an etch pattern comprising a plurality array of unit patterns having a predetermined width/diameter, (b) using the etch pattern to etch frustum-shaped cavities or pits in the thin film structure such that the dimension of the frustum floors of the cavities are substantially equal to a desired pore size based on the predetermined thickness of the thin film structure and the predetermined width/diameter of the unit patterns, and (c) removing the frustum floors at a boundary plane of the thin film structure to expose, open, and thereby create the nanopores substantially having the desired pore size.
- Research Organization:
- LLNL (Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States))
- Sponsoring Organization:
- USDOE
- DOE Contract Number:
- AC52-07NA27344
- Assignee:
- Lawrence Livermore National Security, LLC (Livermore, CA)
- Patent Number(s):
- 8,512,588
- Application Number:
- 12/856,527
- OSTI ID:
- 1092759
- Country of Publication:
- United States
- Language:
- English
Bulk micromachining of silicon
|
journal | January 1998 |
Fabrication of solid-state nanopores with single-nanometre precision
|
journal | July 2003 |
Alignment of mask patterns to crystal orientation
|
journal | May 1996 |
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