Electrochemical Polishing Applications and EIS of a Novel Choline Chloride-Based Ionic Liquid
- Christopher Newport University, Newport News, VA (United States)
- Thomas Jefferson National Accelerator Facility, Newport News, VA (United States)
Minimal surface roughness is a critical feature for high-field superconducting radio frequency (SRF) cavities used to engineer particle accelerators. Current methods for polishing Niobium cavities typically utilize solutions containing a mixture of concentrated sulfuric and hydrofluoric acid. Polishing processes such as these are effective, yet there are many hazards and costs associated with the use (and safe disposal) of the concentrated acid solutions. An alternative method for electrochemical polishing of the cavities was explored using a novel ionic liquid solution containing choline chloride. Potentiostatic electrochemical impedance spectroscopy (EIS) was used to analyze the ionic polishing solution. Final surface roughness of the Nb was found to be comparable to that of the acid-polishing method, as assessed by atomic force microscopy (AFM). This indicates that ionic liquid-based electrochemical polishing of Nb is a viable replacement for acid-based methods for preparation of SRF cavities.
- Research Organization:
- Thomas Jefferson National Accelerator Facility (TJNAF), Newport News, VA (United States)
- Sponsoring Organization:
- USDOE Office of Science (SC)
- DOE Contract Number:
- AC05-06OR23177
- OSTI ID:
- 1089291
- Report Number(s):
- JLAB-ACC-13-1662; DOE/OR/23177-2647; TRN: US1300380
- Journal Information:
- ECS Transactions, Vol. 50, Issue 11; Conference: 222nd ECS Meeting: 2012 Fall Meeting of ECSJ: PRiME 2012: Honolulu, HI (United States), 7-12 Oct 2012; ISSN 1938-5862
- Country of Publication:
- United States
- Language:
- English
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