Seeing Inside Materials by Aberration-Corrected Electron Microscopy

Conference · Mon Dec 31 23:00:00 EST 2007

OSTI ID:1081601

Pennycook, Stephen J ^[1]; Borisevich, Albina Y ^[1]; van Benthem, Klaus ^[1]; Oxley, Mark P ^[1]; Luo, Weidong ^[1]; Oh, Sang Ho ^[1]; Kumar, Dhananjay ^[1]; Werner, P ^[2]; Zakharov, N. D. ^[2]; Molina Rubio, Sergio I ^[1]; Marinopulos, Apostolos ^[3]; Pantelides, Sokrates T ^[1]

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1. ORNL
2. Max Planck Institute of Microstructure Physics
3. Vanderbilt University

The motivation for aberration correction in electron microscopy was primarily to improve lateral resolution, and its successful achievement enabled the direct imaging of sub- ngstrom lattice spacings in a crystal. However, the smaller probe results in greatly enhanced sensitivity for imaging individual atoms, and in addition, the wider useable aperture results in a smaller depth of field.

• Research Organization: Oak Ridge National Laboratory (ORNL)
• Sponsoring Organization: SC USDOE - Office of Science (SC)
• DOE Contract Number: AC05-00OR22725
• OSTI ID: 1081601
• Country of Publication: United States
• Language: English

Related Subjects

Aberration-Corrected Electron