Exploring flatland: AFM of mechanical and electrical properties of graphene, MoS2 and other low-dimensional materials

Journal Article · Tue Jan 01 04:00:00 EST 2013 · Microscopy and Analysis

OSTI ID:1078176

Bertolazzi, Simone ^[1]; Brivio, Jacopo ^[1]; Radenovic, Aleksandra ^[1]; Kis, Andras ^[1]; Wilson, Heather ^[2]; Prisbrey, Landon ^[2]; Minot, Ethan ^[2]; Tselev, Alexander ^[3]; Philips, Mick ^[4]; Viani, Mario ^[4]; Walters, Deron ^[4]; Proksch, Roger ^[4]

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1. Ecole Polytechnique Federale de Lausanne, Switzerland
2. Oregon State University, Corvallis
3. ORNL
4. Asylum Research, Santa Barbara, CA

• Research Organization: Oak Ridge National Laboratory (ORNL); Center for Nanophase Materials Sciences
• Sponsoring Organization: SC USDOE - Office of Science (SC)
• DOE Contract Number: AC05-00OR22725
• OSTI ID: 1078176
• Journal Information: Microscopy and Analysis, Journal Name: Microscopy and Analysis Journal Issue: 3 Vol. 27
• Country of Publication: United States
• Language: English