UV Ozone Treatment for Improving Contact Resistance on Graphene
Journal Article
·
· Journal of Vacuum Science & Technology B
- National Central University, Taiwan
- University of Florida
- National Chiao Tung University, Hsinchu, Taiwan
- Korea University
- ORNL
Optimized UV ozone cleaning of graphene layers on SiO2/Si substrates is shown to improve contact resistance of e-beam evaporated Ti/Au contacts by three orders of magnitude (3x10-6 -cm2) compared to untreated surfaces (4x10-3 -cm2). Subsequent annealing at 300 C lowers the minimum value achieved to 7x10-7 -cm2. Ozone exposure beyond an optimum time (6 mins in these experiments) led to a sharp increase in sheet resistance of the graphene, producing degraded contact resistance. The UV ozone treatment is a simple and effective method for producing high quality contacts to graphene.
- Research Organization:
- Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States). Center for Nanophase Materials Sciences (CNMS)
- Sponsoring Organization:
- USDOE Office of Science (SC)
- DOE Contract Number:
- DE-AC05-00OR22725
- OSTI ID:
- 1052259
- Journal Information:
- Journal of Vacuum Science & Technology B, Vol. 30, Issue 6; ISSN 2166-2746
- Country of Publication:
- United States
- Language:
- English
Similar Records
Highly reproducible and reliable metal/graphene contact by ultraviolet-ozone treatment
Modulation of contact resistance between metal and graphene by controlling the graphene edge, contact area, and point defects: An ab initio study
Improved low resistance contacts of Ni/Au and Pd/Au to p-type GaN using a cryogenic treatment
Journal Article
·
Fri Mar 21 00:00:00 EDT 2014
· Journal of Applied Physics
·
OSTI ID:1052259
+6 more
Modulation of contact resistance between metal and graphene by controlling the graphene edge, contact area, and point defects: An ab initio study
Journal Article
·
Wed May 14 00:00:00 EDT 2014
· Journal of Applied Physics
·
OSTI ID:1052259
+3 more
Improved low resistance contacts of Ni/Au and Pd/Au to p-type GaN using a cryogenic treatment
Conference
·
Sat Jul 01 00:00:00 EDT 2000
·
OSTI ID:1052259