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U.S. Department of Energy
Office of Scientific and Technical Information

Multilayer Laue Lens Growth at NSLS-II

Conference ·
OSTI ID:1048188
The new NSLS-II deposition laboratory has been commissioned to include a variety of thin-film characterization equipment and a next-generation deposition system. The primary goal for this effort is R&D on the multilayer Laue lens (MLL), which is a new type of x-ray optic with the potential for an unprecedented level of x-ray nano-focusing. This unique deposition system contains many design features in order to facilitate growth of combined depth-graded and laterally graded multilayers with precise thickness control over many thousands of layers, providing total film growth in one run of up to 100 {micro}m thick or greater. A precision in-vacuum linear motor servo system raster scans a substrate over an array of magnetrons with shaped apertures at well-defined velocities to affect a multilayer coating. The design, commissioning, and performance metrics of the NSLS-II deposition system will be discussed. Latest growth results of both MLL and reflective multilayers in this machine will be presented.
Research Organization:
Brookhaven National Laboratory (BNL) National Synchrotron Light Source
Sponsoring Organization:
USDOE SC OFFICE OF SCIENCE (SC)
DOE Contract Number:
AC02-98CH10886
OSTI ID:
1048188
Report Number(s):
BNL--98101-2012-CP; 39KC02000
Country of Publication:
United States
Language:
English

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