Beam Damage of HS (CH2)15 COOH Terminated Self Assembled Monolayer (SAM) as Observed by X-Ray Photoelectron Spectroscopy
Journal Article
·
· Surface Science Spectra
XPS spectra of HS(CH{sub 2}){sub 15} COOH terminated a self assembled monolayer (SAM)sample was collected over a period of 242 minutes to determine specimen damage during long exposures to monochromatic Al Ka x-rays. For this COOH terminated SAM we measured the loss of oxygen as a function of time by rastering a focused 100 W, 100 um diameter x-ray beam over a 1.4 mm x 0.2 mm area of the sample.
- Research Organization:
- Pacific Northwest National Lab. (PNNL), Richland, WA (United States). Environmental Molecular Sciences Lab. (EMSL)
- Sponsoring Organization:
- USDOE
- DOE Contract Number:
- AC05-76RL01830
- OSTI ID:
- 1047423
- Report Number(s):
- PNNL-SA-61287; SSSPEN; 8221a; KP1704020; TRN: US1203944
- Journal Information:
- Surface Science Spectra, Vol. 18, Issue 1; ISSN 1055-5269
- Country of Publication:
- United States
- Language:
- English
Similar Records
Metal overlayers on organic functional groups of self-assembled monolayers. VI. X-ray photoelectron spectroscopy of Cr/COOH on 16-mercaptohexadecanoic acid
Beam Damage of Poly(Vinyl Chloride) [PVC] Film as Observed by X-ray Photoelectron Spectroscopy
X-ray damage to CF sub 3 CO sub 2 (trifluoroacetyl) -terminated organic monolayers on Si/Au supports is due primarily to X-ray-induced electrons. Technical report
Journal Article
·
Mon May 01 00:00:00 EDT 1995
· Journal of Vacuum Science and Technology, A
·
OSTI ID:1047423
Beam Damage of Poly(Vinyl Chloride) [PVC] Film as Observed by X-ray Photoelectron Spectroscopy
Journal Article
·
Sat Mar 08 00:00:00 EST 2003
· Surface Science Spectra
·
OSTI ID:1047423
+2 more
X-ray damage to CF sub 3 CO sub 2 (trifluoroacetyl) -terminated organic monolayers on Si/Au supports is due primarily to X-ray-induced electrons. Technical report
Technical Report
·
Sun Dec 01 00:00:00 EST 1991
·
OSTI ID:1047423
+1 more