In Situ X-Ray Fluorescence Measurements During Atomic Layer Deposition: Nucleation and Growth of TiO2 on Planar Substrates and in Nanoporous Films

Journal Article · Sat Dec 31 04:00:00 EST 2011 · Journal of Physical Chemistry C

DOI:https://doi.org/10.1021/jp111314b· OSTI ID:1042236

Dendooven, J; Sree, S; DeKeyser, K; Deduytsche, D; Martens, J; Ludwig, K; Detavernier, C

Synchrotron-based X-ray fluorescence (XRF) is introduced as a promising in situ technique to monitor atomic layer deposition cycle-per-cycle. It is shown that the technique is greatly suitable to study initial nucleation on planar substrates. The initial growth of TiO{sub 2} from tetrakis(dimethylamino)titanium (TDMAT) and H{sub 2}O is found to be linear on thermally grown SiO{sub 2}, substrate-inhibited on H-terminated Si and substrateenhanced on atomic layer deposited Al{sub 2}O{sub 3}. Furthermore, in situ XRF is employed to monitor the Ti uptake during deposition of TiO{sub 2} in nanoporous silica films. In mesoporous films, the Ti content varied quadratically with the number of cycles, a behavior that is attributed to a decreasing surface area with progressing deposition. In microporous films, the XRF data suggest that 1-3 ALD cycles shrunk the pore diameters below the kinetic diameter of the TDMAT molecule.

• Research Organization: BROOKHAVEN NATIONAL LABORATORY (BNL)
• Sponsoring Organization: USDOE SC OFFICE OF SCIENCE (SC)
• DOE Contract Number: AC02-98CH10886
• OSTI ID: 1042236
• Report Number(s): BNL--97914-2012-JA
• Journal Information: Journal of Physical Chemistry C, Journal Name: Journal of Physical Chemistry C Journal Issue: 14 Vol. 115; ISSN 1932-7447
• Country of Publication: United States
• Language: English

Related Subjects

37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CHEMISTRY
DEPOSITION
FLUORESCENCE
KINETICS
MONITORS
NUCLEATION
SILICA
SUBSTRATES
SURFACE AREA