Ferroelectric Domain Scaling and Switching in Ultrathin BiFeO3 Films Deposited on Vicinal Substrates

Journal Article · Sun Jan 01 04:00:00 EST 2012 · New Journal of Physics

DOI:https://doi.org/10.1088/1367-2630/14/5/053040· OSTI ID:1041090

Shelke, Vilas ^[1]; Mazumdar, Dipanjan ^[1]; Jesse, Stephen ^[2]; Kalinin, Sergei V ^[2]; Baddorf, Arthur P ^[2]; Gupta, Dr. Arunava ^[1]

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1. University of Alabama, Tuscaloosa
2. ORNL

We report on electrically switchable polarization and ferroelectric domain scaling over a thickness range of 5-100 nm in BiFeO{sub 3} films deposited on [110] vicinal substrates. The BiFeO{sub 3} films of variable thickness were deposited with SrRuO{sub 3} bottom layer using the pulsed laser deposition technique. The domains are engineered into preferentially oriented patterns due to substrate vicinality along the [110] direction. The domain width scales closely with the square root of film thickness, in agreement with the Landau-Lifschitz-Kittel (LLK) law. Switching spectroscopy piezo-response force microscopy provides clear evidence for the ferroelectric switching behavior in all the films.

• Research Organization: Oak Ridge National Laboratory (ORNL); Center for Nanophase Materials Sciences
• Sponsoring Organization: SC USDOE - Office of Science (SC)
• DOE Contract Number: AC05-00OR22725
• OSTI ID: 1041090
• Journal Information: New Journal of Physics, Journal Name: New Journal of Physics Journal Issue: 5 Vol. 14; ISSN 1367-2630
• Country of Publication: United States
• Language: English

Related Subjects

71 CLASSICAL AND QUANTUM MECHANICS
GENERAL PHYSICS
DEPOSITION
LASERS
MICROSCOPY
POLARIZATION
SPECTROSCOPY
SUBSTRATES
THICKNESS