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In situ x-ray investigation of freestanding nanoscale Cu-Nb multilayers under tensile load.

Journal Article · · Applied Physics Letters
DOI:https://doi.org/10.1063/1.3074374· OSTI ID:1038666

The yield behavior in a freestanding sputter-deposited Cu/Nb multilayer with 30 nm nominal individual layer thickness has been investigated with in situ synchrotron x-ray diffraction during tensile loading. A pronounced elastic-plastic transition is observed with the fraction of plastically yielded grains increasing gradually with strain. Near synchronous yielding is observed in the Cu and Nb grains. The gradual progression in yield behavior is interpreted in terms of residual stresses, and elastic and plastic anisotropy.

Research Organization:
Argonne National Laboratory (ANL)
Sponsoring Organization:
SC
DOE Contract Number:
AC02-06CH11357
OSTI ID:
1038666
Report Number(s):
ANL/XSD/JA-66466
Journal Information:
Applied Physics Letters, Journal Name: Applied Physics Letters Journal Issue: 3 Vol. 94; ISSN APPLAB; ISSN 0003-6951
Country of Publication:
United States
Language:
ENGLISH

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