X-ray Laue Diffraction Microscopy in 3D at the Advanced Photon Source

Conference · Sat Jan 01 04:00:00 EST 2011

OSTI ID:1027426

Liu, W. ^[1]; Zschack, P. ^[1]; Tischler, Jonathan Zachary ^[2]; Ice, Gene E ^[2]; Larson, Ben C ^[2]

---

1. Argonne National Laboratory (ANL)
2. ORNL

Studies of materials on mesoscopic length-scales require a penetrating structural probe with submicron point-to-point spatial resolution. The principle research activities at beamline 34-ID-E of the Advanced Photon Source (APS) involve development of exciting new micro-/nano-diffraction techniques for characterization and microscopy in support of both applied engineering and fundamental materials research. Taking advantage of the high brightness of the source, advanced focusing mirrors, a novel depth profiling technique, and high-speed area detectors, three-dimensional scanning Laue diffraction microscopy provides detailed local structural information of crystalline materials, such as crystallographic orientation, orientation gradients, and strain tensors. It is general and applicable to single-crystal, polycrystalline, composite, deformed, and functionally graded materials. Applications include 3D diffraction investigations for a diverse and growing user community with interests in materials deformation, electro-migration, recrystallization, fatigue, solid-solution precipitation, high-pressure environments, and condensed matter physics.

• Research Organization: Oak Ridge National Laboratory (ORNL)
• Sponsoring Organization: SC USDOE - Office of Science (SC)
• DOE Contract Number: AC05-00OR22725
• OSTI ID: 1027426
• Country of Publication: United States
• Language: English

Related Subjects

43 PARTICLE ACCELERATORS
ADVANCED PHOTON SOURCE
BRIGHTNESS
DEFORMATION
DIFFRACTION
FOCUSING
MICROSCOPY
MIRRORS
ORIENTATION
PHYSICS
PRECIPITATION
PROBES
RECRYSTALLIZATION
SPATIAL RESOLUTION
STRAINS