Thermally Switchable Thin Films of an ABC Triblock Copolymer of Poly(n-butyl methacrylate)-poly(methyl methacrylate)-poly(2-fluoroethyl methacrylate)

Journal Article · Sat Jan 01 04:00:00 EST 2011 · Applied Surface Science

DOI:https://doi.org/10.1016/j.apsusc.2011.06.098· OSTI ID:1027417

Zhang, Shanju ^[1]; Liu, Zhan ^[1]; Bucknall, David G. ^[1]; He, Lihong ^[2]; Hong, Kunlun ^[2]; Mays, Jimmy ^[2]; Allen, Mark ^[1]

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1. Georgia Institute of Technology
2. ORNL

The thermo-responsive behavior of polymer films consisting of novel linear triblock copolymers of poly(n-butyl methacrylate)-poly(methyl methacrylate)-poly(2-fluoroethyl methacrylate) (PnBuMA-PMMA-P2FEMA) are reported using differential scanning calorimetry (DSC), atomic forcing microscopy (AFM), X-ray photoelectron spectroscopy (XPS) and contacting angle (CA) measurements. The surface morphology, wettability and chemical structure of thin films of these triblock copolymers on silicon wafers as a function of temperature have been investigated. It has been shown that the wettability of the films is thermally switchable. Detailed structural analysis shows that thermo-responsive surface composition changes are produced. The underlying mechanism of the thermoresponsive behavior is discussed.

• Research Organization: Oak Ridge National Laboratory (ORNL); Center for Nanophase Materials Sciences
• Sponsoring Organization: SC USDOE - Office of Science (SC)
• DOE Contract Number: AC05-00OR22725
• OSTI ID: 1027417
• Journal Information: Applied Surface Science, Journal Name: Applied Surface Science Journal Issue: 22 Vol. 257; ISSN ASUSEE; ISSN 0169-4332
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
CALORIMETRY
COPOLYMERS
MICROSCOPY
MORPHOLOGY
POLYMERS
SILICON
THIN FILMS
WETTABILITY
X-RAY PHOTOELECTRON SPECTROSCOPY