Hot-Wire CVD Amorphous Si Materials for Solar Cell Application
Hydrogenated amorphous silicon (a-Si:H) thin films and their application to solar cells fabricated using the hot-wire chemical vapor deposition (HWCVD) or (CAT)-CVD will be reviewed. This review will focus on the comparison to the standard plasma enhance (PE) CVD in the terms of deposition technique, film properties, and solar cell performance. The advantages of using HWCVD for a-Si:H solar cell research as well as the criteria for industry's adaptation of this technique for mass production will be addressed.
- Research Organization:
- National Renewable Energy Laboratory (NREL), Golden, CO.
- Sponsoring Organization:
- USDOE Office of Solar Energy Technologies Program
- DOE Contract Number:
- AC36-08GO28308
- OSTI ID:
- 1023705
- Journal Information:
- Thin Solid Films, Journal Name: Thin Solid Films Journal Issue: 12, 2009 Vol. 517; ISSN THSFAP; ISSN 0040-6090
- Country of Publication:
- United States
- Language:
- English
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