Effects of interfacial roughness on electron and phonon scattering rates.
Conference
·
OSTI ID:1020412
No abstract prepared.
- Research Organization:
- Sandia National Laboratories
- Sponsoring Organization:
- USDOE
- DOE Contract Number:
- AC04-94AL85000
- OSTI ID:
- 1020412
- Report Number(s):
- SAND2010-4109C
- Country of Publication:
- United States
- Language:
- English
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