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Title: Texture of Cobalt Germanides on Ge(100) and Ge(111) and Its Influence on the Formation Temperature

Journal Article · · Journal of the Electrochemical Society
DOI:https://doi.org/10.1149/1.3294702· OSTI ID:1019787

The phase formation of cobalt germanides on Ge(100) and Ge(111) substrates was investigated using in situ X-ray diffraction, starting from room-temperature sputter-deposited Co films. The formation temperature of the CoGe{sub 2} phase was dependent on the substrate orientation. X-ray pole figures and electron backscatter diffraction measurements were used to identify the texture and microstructure of the CoGe{sub 2} and the preceding Co{sub 5}Ge{sub 7} films. A significant difference in preferential orientation was found in the Co{sub 5}Ge{sub 7} films, depending on the substrate orientation. This influences the formation temperature of the CoGe{sub 2} and results in the coexistence of Co{sub 5}Ge{sub 7} and CoGe{sub 2} on Ge(111) in a large temperature window.

Research Organization:
Brookhaven National Lab. (BNL), Upton, NY (United States). National Synchrotron Light Source
Sponsoring Organization:
DOE - OFFICE OF SCIENCE
DOE Contract Number:
DE-AC02-98CH10886
OSTI ID:
1019787
Report Number(s):
BNL-95633-2011-JA; JESOAN; TRN: US201115%%423
Journal Information:
Journal of the Electrochemical Society, Vol. 157, Issue 4; ISSN 0013-4651
Country of Publication:
United States
Language:
English