Metastable Phase Formation During the Reaction of Ni Films with Si(001): the Role of Texture Inheritance

Journal Article · Fri Jan 01 04:00:00 EST 2010 · Journal of Applied Physics

DOI:https://doi.org/10.1063/1.3327451· OSTI ID:1019776

Gaudet, S; Coia, C; Desjardins, P; Lavoie, C

The thermally induced solid-state reaction between a 10-nm-thick Ni film and a Si(001) substrate was investigated using in situ x-ray diffraction and ex situ pole figure analyses. The reaction begins with the appearance of orthorhombic Ni{sub 2}Si grains characterized by a strong fiber texture. The formation of the metastable hexagonal {theta} phase - which inherits the fiber texture of Ni{sub 2}Si - is then observed. This phase has been observed in every sample studied regardless of dopant, film thickness, deposition method, and anneal profile (>2000 conditions). Texture inheritance allows a reaction pathway with a lower activation energy than the expected formation through thermodynamically stable Ni silicide phases.

• Research Organization: Brookhaven National Laboratory (BNL) National Synchrotron Light Source
• Sponsoring Organization: DOE - OFFICE OF SCIENCE
• DOE Contract Number: AC02-98CH10886
• OSTI ID: 1019776
• Report Number(s): BNL--95622-2011-JA
• Journal Information: Journal of Applied Physics, Journal Name: Journal of Applied Physics Journal Issue: 9 Vol. 107; ISSN JAPIAU; ISSN 0021-8979
• Country of Publication: United States
• Language: English

Related Subjects

71 CLASSICAL AND QUANTUM MECHANICS
GENERAL PHYSICS
ACTIVATION ENERGY
DEPOSITION
FIBERS
SILICIDES
SUBSTRATES
TEXTURE
THICKNESS
X-RAY DIFFRACTION
national synchrotron light source