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Title: High-sensitivity strain mapping around epitaxial oxide nanostructures using scanning x-ray nanodiffraction.

Journal Article · · Appl. Phys. Lett.
DOI:https://doi.org/10.1063/1.3598443· OSTI ID:1019252

The generation and presence of strain around nanostructures of oxides is a key to their growth, properties, and functions, but it has been a challenge to experimentally measure its sign, magnitude, and spatial distribution. Combining diffuse scattering with scanning x-ray nanodiffraction, we have mapped the strain distribution in an oxide-on-oxide nanopatterned structure with a high sensitivity (10{sup -4}) and a submicrometer spatial resolution. An edge-induced strain distribution is observed from a sample of CoFe{sub 2}O{sub 4} nanolines epitaxially grown on MgO substrate, which agrees quantitatively with the numerical simulations.

Research Organization:
Argonne National Lab. (ANL), Argonne, IL (United States)
Sponsoring Organization:
USDOE Office of Science (SC); National Science Foundation (NSF); State of Illinois; Northwestern Univ.
DOE Contract Number:
DE-AC02-06CH11357
OSTI ID:
1019252
Report Number(s):
ANL/XSD/JA-70099; TRN: US201114%%722
Journal Information:
Appl. Phys. Lett., Vol. 98, Issue 25 ; Jun. 20, 2011
Country of Publication:
United States
Language:
ENGLISH