High-sensitivity strain mapping around epitaxial oxide nanostructures using scanning x-ray nanodiffraction.
- X-Ray Science Division
The generation and presence of strain around nanostructures of oxides is a key to their growth, properties, and functions, but it has been a challenge to experimentally measure its sign, magnitude, and spatial distribution. Combining diffuse scattering with scanning x-ray nanodiffraction, we have mapped the strain distribution in an oxide-on-oxide nanopatterned structure with a high sensitivity (10{sup -4}) and a submicrometer spatial resolution. An edge-induced strain distribution is observed from a sample of CoFe{sub 2}O{sub 4} nanolines epitaxially grown on MgO substrate, which agrees quantitatively with the numerical simulations.
- Research Organization:
- Argonne National Lab. (ANL), Argonne, IL (United States)
- Sponsoring Organization:
- USDOE Office of Science (SC); National Science Foundation (NSF); State of Illinois; Northwestern Univ.
- DOE Contract Number:
- DE-AC02-06CH11357
- OSTI ID:
- 1019252
- Report Number(s):
- ANL/XSD/JA-70099; TRN: US201114%%722
- Journal Information:
- Appl. Phys. Lett., Vol. 98, Issue 25 ; Jun. 20, 2011
- Country of Publication:
- United States
- Language:
- ENGLISH
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