Applications and source development for high-repetition rate x-ray lasers
Conference
·
OSTI ID:10181031
- and others
Many applications in material science, chemistry, and atomic physics require an x-ray source that has a repetition rate of 1 Hz to a few kHz. In these fields, a very wide range of photon energies is of interest. One application is time-resolved surface photoelectron spectroscopy and microscopy where low energy (< 1{mu}J) pulses are required to avoid space charge effects but high-repetition rates ({approx} kHz) provide the high average power which is needed to obtain the desired resolution. In pump-probe experiments, it is desirable to have the repetition rate of the x-ray source be comparable to the repetition rate of the corresponding IR, optical, or UV laser. We show that the very high-repetition rate of synchrotrons (1--1000 MHz) results in an inefficient use of x rays for these types of experiments and that a kHz repetition rate x-ray laser would be an excellent source for many experiments. For some applications, a slower repetition rate of order 1 Hz is adequate provide the energy per pulse is larger ({approx}1 mJ). For example, in photoelectron spectroscopy of free clusters, an x-ray laser can provide the required large number of nearly monoenergetic photons during the short time the clusters can be probed in each formation cycle. In the context of source development, we discuss conventional collisional x-ray laser schemes with mJ output pulses that can operate at Hz repetition rates using a high average power driving laser. The near term prospects for high-repetition rate x-ray lasing for photon energies below 100 eV are very good with higher energy capabilities expected in the future. In addition, prospects of table-top size x-ray lasers with kHz repetition rates are presented.
- Research Organization:
- Lawrence Livermore National Lab., CA (United States)
- Sponsoring Organization:
- USDOE, Washington, DC (United States)
- DOE Contract Number:
- W-7405-ENG-48
- OSTI ID:
- 10181031
- Report Number(s):
- UCRL-JC--112493; CONF-930722--30; ON: DE93019547
- Country of Publication:
- United States
- Language:
- English
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