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The effect of reactive elements on the segregation behavior and microstructure of {alpha}-Al{sub 2}O{sub 3} scales on {beta}-NiAl

Conference ·
OSTI ID:10155792
In order to improve oxidation resistance, small amounts of oxygen- active or ``reactive`` elements (RE) such as Y, Zr, Hf, Ce are added to chromia- and alumina-forming high-temperature alloys. As an alternative to a system where the RE-ion supply is self-limiting (Y-implant), it was desired to study effect of RE source-removal on microstructure and grain boundary segregation levels. {beta}-NiAl doped with 0.23 wt% Zr was oxidized in oxygen at 1500 C for 50 h. Upon cooling, the scale spalled into pieces; these spalled {alpha}-Al{sub 2}O{sub 3} scales were then annealed in air at 1500 C for 1 and 50 h. Specimens were fabricated parallel to metal/scale interface, and grain boundary chemistries were determined using X-ray energy dispersive spectrometry. Results show that no qualitative change in microstructural scale or zirconia particle size/density occurs after annealing, which is consistent with the model in which the gas- interface microstructure development depends on a continuous supply of zirconia diffusing from the metal interface towards the gas interface.
Research Organization:
Oak Ridge National Lab., TN (United States)
Sponsoring Organization:
USDOE, Washington, DC (United States)
DOE Contract Number:
AC05-84OR21400
OSTI ID:
10155792
Report Number(s):
CONF-940753--10; ON: DE94012739
Country of Publication:
United States
Language:
English