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Durable silver mirror with ultra-violet thru far infra-red reflection

Patent ·
OSTI ID:1014761

A durable highly reflective silver mirror characterized by high reflectance in a broad spectral range of about 300 nm in the UV to the far infrared (.about.10000 nm), as well as exceptional environmental durability. A high absorptivity metal underlayer is used which prevents the formation of a galvanic cell with a silver layer while increasing the reflectance of the silver layer. Environmentally durable overcoat layers are provided to enhance mechanical and chemical durability and protect the silver layer from corrosion and tarnishing, for use in a wide variety of surroundings or climates, including harsh or extreme environments.

Research Organization:
Lawrence Livermore National Security, LLC (Livermore, CA)
Sponsoring Organization:
USDOE
DOE Contract Number:
W-7405-ENG-48
Assignee:
Lawrence Livermore National Security, LLC (Livermore, CA)
Patent Number(s):
7,838,134
Application Number:
US Patent Application 11/286,368
OSTI ID:
1014761
Country of Publication:
United States
Language:
English

References (9)

Strategy for successfully coating a 22” diameter mirror for the keck telescope with protected silver using 6” sputter cathodes conference January 2001
Protected silver coatings for flashlamp-pumped Nd:glass amplifiers conference April 1999
UV-shifted durable silver coating for astronomical mirrors conference July 2000
Practical Design and Production of Optical Thin Films reference-book July 2002
Protected silver coating for astronomical mirrors conference August 1998
Prevention of corrosion of silver reflectors for the National Ignition Facility
  • Thomas, Norman L.; Siekhaus, Wigbert J.; Farmer, Joseph C.
  • SPIE's International Symposium on Optical Science, Engineering, and Instrumentation, SPIE Proceedings https://doi.org/10.1117/12.328510
conference October 1998
Minimum-time spacecraft maneuver using sliding-mode control journal January 2004
Deposition of durable wide-band silver mirror coatings using long-throw, low-pressure, DC-pulsed magnetron sputtering conference February 2003
Multi component EUV multilayer mirrors conference June 2003

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