Combination of ToF-SIMS imaging and AFM to study the early stages of corrosion in Al-Cu thin films
Journal Article
·
· Corrosion Science
OSTI ID:1014235
- Ecole Nationale Superieure de Chimie de Paris
- Sandia National Laboratories (SNL)
- Ohio State University
- ORNL
The pitting corrosion of Al-Cu thin film alloys was investigated using samples that were heat treated in air to form through-thickness Al2Cu particles within an Al-0.5%Cu matrix. Time-of-Flight SIMS (ToF-SIMS) analysis revealed Cu-rich regions 250 - 800 nm in lateral extent near the metal/oxide interface. Following exposure that generated pitting corrosion, secondary electron, secondary ion, and AFM images showed pits with size and density similar to those of the Cu-rich regions. The role of the Cu-rich regions is addressed.
- Research Organization:
- Oak Ridge National Laboratory (ORNL)
- Sponsoring Organization:
- SC USDOE - Office of Science (SC)
- DOE Contract Number:
- AC05-00OR22725
- OSTI ID:
- 1014235
- Journal Information:
- Corrosion Science, Journal Name: Corrosion Science Journal Issue: N Vol. 6; ISSN 0010-938X; ISSN CRRSAA
- Country of Publication:
- United States
- Language:
- English
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