Ion beam assisted deposition of tribological coatings. Quarterly summary
Technical Report
·
OSTI ID:10139136
TiN coatings 5 micrometers thick were deposited in UHV IBAD chamber onto M50 and Si substrates over a wide range of R (Ar-ion-to-Ti-atom ratio) values. Sputtering reduced the actual thickness at high R values, with two out of every three deposited Ti atoms being removed at R = 0.7. Because of charge exchange neutralization, it was possible to obtain coatings in the UHV IBAD system with properties equivalent to those deposited in the high vacuum IBAD system by using a higher apparent R value. Unless the extent of the charge exchange neutralization is known, it will not be possible to duplicate coating properties. Adhesion of the thick TiN coating deposited at R - 0.5 was equivalent to a magnetron sputtered TiN coating. Thick Cr{sub 2}O{sub 3} coatings were deposited onto M50 and Si substrates and wear testing was initiated. At high R values, sputtering prevented chemisorption of oxygen at surface. The wear process eliminated most of the surface topography.
- Research Organization:
- Naval Research Lab., Washington, DC (United States)
- Sponsoring Organization:
- USDOE, Washington, DC (United States)
- DOE Contract Number:
- AI02-88CE90024
- OSTI ID:
- 10139136
- Report Number(s):
- DOE/CE/90024--5; ON: DE93011524
- Country of Publication:
- United States
- Language:
- English
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