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Silicon-film{trademark} on ceramic solar cells. Final report

Technical Report ·
DOI:https://doi.org/10.2172/10135001· OSTI ID:10135001
The Silicon-Film{trademark} design achieves high performance through the use of a thin silicon layer. Optimally designed thin crystalline solar cells (<50 microns thick) have performance advantages over conventional thick devices. The enhancement in performance requires the incorporation of back-surface passivation and light trapping. The high-performance Silicon-Film{trademark} design employs a metallurgical barrier between the low-cost substrate and the thin silicon layer. The properties of the metallurgical barrier must be engineered to implement specific device requirements, such as high back-surface reflectivity. Recent advances in process development are described here.
Research Organization:
Sandia National Labs., Albuquerque, NM (United States); AstroPower, Inc., Newark, DE (United States)
Sponsoring Organization:
USDOE, Washington, DC (United States)
DOE Contract Number:
AC04-76DP00789
OSTI ID:
10135001
Report Number(s):
SAND--92-7011; ON: DE93009608
Country of Publication:
United States
Language:
English

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