INJECTION STRAIGHT PULSED MAGNET ERROR TOLERANCE STUDY FOR TOP-OFF INJECTION
NSLS II is designed to work in top-off injection mode. The injection straight includes a septum and four fast kicker magnets. The pulsed magnet errors will excite a betatron oscillation. This paper gives the formulas of each error contribution to the oscillation amplitude at various source points in the ring. These are compared with simulation results. Based on the simple formulas, we can specify the error tolerances on the pulsed magnets with the goal to minimize the injection transient and scale it to similar machines. The NSLS-II is a 3 GeV third generation synchrotron light source under construction at Brookhaven National Laboratory. Due to its short lifetime, NSLS-II storage ring requires the top-off injection (once per minute) during which the stored beam orbit is highly desired as transparent. But the errors, from the SR pulsed magnets at the injection straight - kickers (non-closed injection bump) and pulsed septum (time-dependent stray field), excite a stored beam betatron oscillation. The magnitude of the perturbation can be large disturning some of the user experiments. In 2010 injection straight review, based on the experts experiences in ALS, DIAMOND, SLS and SPEAR, we came to the conclusion that the acceptable oscillation amplitude at the long straight is set as 100 {micro}m (i.e. 0.7 {sigma}x) in horizontal plane and 12 {micro}m, 2.5 {sigma}y, in vertical plane for NSLS II. This paper gives the analysis estimate of the different error source tolerance from the pulse magnets and scales it to our requirements. The result is compared with simulation.
- Research Organization:
- Brookhaven National Lab. (BNL), Upton, NY (United States)
- Sponsoring Organization:
- DOE - Office Of Science
- DOE Contract Number:
- DE-AC02-98CH10886
- OSTI ID:
- 1012589
- Report Number(s):
- BNL-94871-2011-CP; 39KC02000; TRN: US1102331
- Resource Relation:
- Conference: 2011 Particle Accelerator Conference; New York, NY; 20110328 through 20110401
- Country of Publication:
- United States
- Language:
- English
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