Dithering Strategies and Point-Source Photometry
The accuracy in the photometry of a point source depends on the point-spread function (PSF), detector pixelization, and observing strategy. The PSF and pixel response describe the spatial blurring of the source, the pixel scale describes the spatial sampling of a single exposure, and the observing strategy determines the set of dithered exposures with pointing offsets from which the source flux is inferred. In a wide-field imaging survey, sources of interest are randomly distributed within the field of view and hence are centered randomly within a pixel. A given hardware configuration and observing strategy therefore have a distribution of photometric uncertainty for sources of fixed flux that fall in the field. In this article we explore the ensemble behavior of photometric and position accuracies for different PSFs, pixel scales, and dithering patterns. We find that the average uncertainty in the flux determination depends slightly on dither strategy, whereas the position determination can be strongly dependent on the dithering. For cases with pixels much larger than the PSF, the uncertainty distributions can be non-Gaussian, with rms values that are particularly sensitive to the dither strategy. We also find that for these configurations with large pixels, pointings dithered by a fractional pixel amount do not always give minimal average uncertainties; this is in contrast to image reconstruction for which fractional dithers are optimal. When fractional pixel dithering is favored, a pointing accuracy of better than {approx}0.15 {approx}0.15 pixel width is required to maintain half the advantage over random dithers.
- Research Organization:
- Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)
- Sponsoring Organization:
- Physics Division
- DOE Contract Number:
- DE-AC02-05CH11231
- OSTI ID:
- 1012370
- Report Number(s):
- LBNL-4424E; TRN: US201109%%798
- Journal Information:
- Publications of the Astronomical Society of the Pacific, Vol. 123, Issue 902; ISSN 0004-6280
- Country of Publication:
- United States
- Language:
- English
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