Time-optimal control of the magnetically levitated photolithography platen
This report summarizes two approaches to time-optimal control of a nonlinear magnetically levitated platen. The system of interest is a candidate technology for next-generation photolithography machines used in the manufacture of integrated circuits. The dynamics and the variable peak control force of the electro-magnetic actuators preclude the direct application of classical time-optimal control methodologies for determining optimal rest-to-rest maneuver strategies. Therefore, this study explores alternate approaches using a previously developed computer simulation. In the first approach, conservative estimates of the available control forces are used to generate suboptimal switching curves. In the second approach, exact solutions are determined iteratively and used as a training set for an artificial neural network. The trained network provides optimal actuator switching times that incorporate the full nonlinearities of the magnetic levitation actuators. Sample problems illustrate the effectiveness of these techniques as compared to traditional proportional-derivative control.
- Research Organization:
- Sandia National Labs., Albuquerque, NM (United States)
- Sponsoring Organization:
- USDOE, Washington, DC (United States)
- DOE Contract Number:
- AC04-94AL85000
- OSTI ID:
- 10111083
- Report Number(s):
- SAND--94-2423; ON: DE95005493; BR: GB0103012
- Country of Publication:
- United States
- Language:
- English
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