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U.S. Department of Energy
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The deposition of boron nitride and carbon films on silica glass fibers

Technical Report ·
DOI:https://doi.org/10.2172/10110580· OSTI ID:10110580
A chemical vapor deposition technique is used to produce amorphous boron nitride and carbon thin films on high strength silica glass fibers. In this method, the fiber is drawn under ultra high vacuum conditions and low pressure process gases, in the presence of a hot tungsten filament, are used to grow films at low substrate temperatures. Films deposited with this technique do not degrade the intrinsic pristine strength of the silica fibers under dry conditions and, when stressed in chemically aggressive environments, act as effective barrier coatings.
Research Organization:
Sandia National Labs., Albuquerque, NM (United States)
Sponsoring Organization:
USDOE, Washington, DC (United States)
DOE Contract Number:
AC04-94AL85000
OSTI ID:
10110580
Report Number(s):
SAND--92-1108; ON: DE94004684; BR: GB0103012
Country of Publication:
United States
Language:
English