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An Atom Probe Field Ion Microscope Investigation Of The Role Of Boron In Precipitates And At Grain Boundaries In NiAl

Conference · · Materials Research Society Symposia Proceedings
DOI:https://doi.org/10.1557/proc-238-445· OSTI ID:10110011
 [1];  [1]
  1. Oak Ridge National Laboratory (ORNL), Oak Ridge, TN (United States)
The high resolution analytical technique of Atom Probe Field Ion Microscopy (APFTM) haseen used to characterize grain boundaries and the matrix of a stoichiometric NiAl alloy doped with 0.04 (100 wppm) and 0.12 at. % (300 wppm) boron. Field ion images revealed boron segregation to the grain boundaries. Atom probe elemental analysis of the grain boundaries measured a boron coverage of up to 30% of a monolayer. Extensive atom probe analyses also revealed a fine dispersion of nanoscale boride precipitates in the matrix. The boron segregation to the grain boundaries was found to correlate with the observed suppression of intergranular fracture. However, the decrease in ductility of boron-doped NiAl is attributed in part to the precipitation hardening effect of the boride phases.
Research Organization:
Oak Ridge National Laboratory (ORNL), Oak Ridge, TN (United States)
Sponsoring Organization:
USDOE Office of Science (SC), Basic Energy Sciences (BES). Materials Sciences & Engineering Division (MSE)
DOE Contract Number:
AC05-84OR21400
OSTI ID:
10110011
Report Number(s):
CONF-911202--13; ON: DE92005102
Conference Information:
Journal Name: Materials Research Society Symposia Proceedings Journal Volume: 238
Country of Publication:
United States
Language:
English

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