Magnetically controlled deposition of metals using gas plasma. Quarterly progress report, July 1994--September 1994
Technical Report
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OSTI ID:10102398
This document reports the status of grant DE-FE07-93ID13220 for the July-September, 1994 quarter. The objective of this grant is to develop a method of spraying materials on a substrate in a controlled manner to eliminate the waste inherent in the present process. Thin layers of secondary material are plated on substrates either by plating or spraying processes. Plating operations produce large amounts of hazardous liquid waste. Spraying, while one of the less waste intensive methods, produces `over spray` which is waste that is a result of the uncontrolled nature of the spray stream. In many cases the over spray produces a hazardous waste.
- Research Organization:
- Idaho National Engineering Lab., Idaho Falls, ID (United States)
- Sponsoring Organization:
- USDOE, Washington, DC (United States)
- DOE Contract Number:
- FG07-93ID13220
- OSTI ID:
- 10102398
- Report Number(s):
- DOE/ID/13220-T2; ON: DE95003827; TRN: 95:000140
- Resource Relation:
- Other Information: PBD: [1995]
- Country of Publication:
- United States
- Language:
- English
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