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Title: Characteristics of the MBE1 End-Station at PNC/XOR

Conference ·
OSTI ID:1009006

An end-station for in-situ characterization of thin films at the PNC/XOR undulator beamline, Sector 20 of the Advanced Photon Source, is detailed. The ability to study films in-situ on a beamline enables examination of surfaces and interfaces on freshly-prepared films, without the influence of a capping layer. The MBE1 molecular beam epitaxy system was designed with this in mind. Now in routine operation and available for General Users on a collaborative basis, the primary function of MBE1 is to undertake polarization-dependent XAFS studies on fresh or stored films, but it also has the capability to do X-ray Standing Wave and Reflectivity measurements. The characteristics of the MBE1 system - its ranges of motions and detector options - are described in detail, with example data illustrating its functionality.

Research Organization:
Argonne National Lab. (ANL), Argonne, IL (United States). Advanced Photon Source (APS)
Sponsoring Organization:
USDOE
OSTI ID:
1009006
Resource Relation:
Conference: 13th International Conference on X-ray Absorption Fine Structure-XAFS13;9-14 July 2006;Stanford, California, USA
Country of Publication:
United States
Language:
ENGLISH

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