Surface x-ray-diffraction study and quantum well analysis of the growth and atomic-layer structure of ultrathin Pb/Si(111) films
Journal Article
·
· Phys. Rev. B
OSTI ID:1008649
- UIUC
Abstract not provided
- Research Organization:
- Advanced Photon Source (APS), Argonne National Laboratory (ANL), Argonne, IL (US)
- Sponsoring Organization:
- USDOE
- OSTI ID:
- 1008649
- Journal Information:
- Phys. Rev. B, Journal Name: Phys. Rev. B Journal Issue: (3) ; 2005 Vol. 72
- Country of Publication:
- United States
- Language:
- ENGLISH
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