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Direct to Digital Holography for Semiconductor Wafer Defect Detection and Review

Conference ·
OSTI ID:1003667
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  1. nLine Corporation, Austin, TX
  2. ORNL
+ Show Author Affiliations
A method for recording true holograms (not holographic interferometry) directly to a digital video medium in a single image has been invented. This technology makes the amplitude and phase for every pixel of the target object wave available. Since phase is proportional to wavelength, this makes high-resolution metrology an implicit part of the holographic recording. Measurements of phase can be made to one hundredth or even one thousandth of a wavelength, so the technology is attractive for finding defects on semiconductor wafers, where feature sizes are now smaller than the wavelength of even deep ultra-violet light.
Research Organization:
Oak Ridge National Laboratory (ORNL), Oak Ridge, TN (United States)
Sponsoring Organization:
USDOE
DOE Contract Number:
AC05-00OR22725
OSTI ID:
1003667
Country of Publication:
United States
Language:
English

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Related Subjects

36 MATERIALS SCIENCE
DEFECTS
DETECTION
Digital Holography
HOLOGRAPHY
SEMICONDUCTOR MATERIALS
SENSITIVITY