Structural Control of Vertically Aligned Multiwalled Carbon Nanotubes by Radio-Frequency Plasmas
- Michigan Technological University
- ORNL
Plasma-enhanced chemical vapor deposition is the only technique for growing individual vertically aligned multiwalled carbon nanotubes (VA-MWCNTs) at desired locations. Inferior graphitic order has been a long-standing issue that has prevented realistic applications of these VA-MWCNTs. Previously, these VA-MWCNTs were grown by a one-plasma approach. Here, we demonstrate the capability of controlling graphitic order and diameters of VA-MWCNTs by decoupling the functions of the conventional single plasma into a dual-plasma configuration. Our results indicate that the ionic flux and kinetic energy of the growth species are important for improving graphitic order of VA-MWCMTs.
- Research Organization:
- Oak Ridge National Laboratory (ORNL)
- Sponsoring Organization:
- SC USDOE - Office of Science (SC)
- DOE Contract Number:
- AC05-00OR22725
- OSTI ID:
- 1003577
- Journal Information:
- Applied Physics Letters, Journal Name: Applied Physics Letters Journal Issue: 17 Vol. 87; ISSN 0003-6951
- Country of Publication:
- United States
- Language:
- English
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