Short Focal Length Kirkpatrick-Baez Mirrors for a Hard X-Ray Nanoprobe

Journal Article · Sat Jan 01 00:00:00 EST 2005 · Review of Scientific Instruments

DOI:https://doi.org/10.1063/1.2125730· OSTI ID:1003374

Liu, Wenjun ^[1]; Ice, Gene E ^[1]; Tischler, Jonathan Zachary ^[1]; Khounsary, Ali ^[2]; Liu, Chian ^[2]; Assoufid, Lahsen ^[2]; Macrander, Albert T. ^[2]

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1. ORNL
2. Argonne National Laboratory (ANL)

We describe progress in the fabrication of short-focal-length total-external-reflection Kirkpatrick-Baez x-ray mirrors with ultralow figure errors. The short focal length optics produce nanoscale beams (<100 nm) on conventional ({approx} 64 m long) beamlines at third generation synchrotron sources. The total-external reflection optics are inherently achromatic and efficiently focus a white (polychromatic) or a tunable monochromatic spectrum of x rays. The ability to focus independent of wavelength allows novel new experimental capabilities. Mirrors have been fabricated both by computer assisted profiling (differential polishing) and by profile coating (coating through a mask onto ultra-smooth surfaces). A doubly focused 85 x 95 nm{sup 2} hard x-ray nanobeam has been obtained on the UNICAT beamline 34-ID at the Advanced Photon Source. The performance of the mirrors, techniques for characterizing the spot size, and factors limiting focusing performance are discussed.

• Research Organization: Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States)
• Sponsoring Organization: USDOE Office of Science (SC)
• DOE Contract Number: DE-AC05-00OR22725
• OSTI ID: 1003374
• Journal Information: Review of Scientific Instruments, Vol. 76, Issue 11; ISSN 0034-6748
• Country of Publication: United States
• Language: English

Related Subjects

43 PARTICLE ACCELERATORS
ADVANCED PHOTON SOURCE
COATINGS
COMPUTERS
FABRICATION
FOCUSING
MIRRORS
OPTICS
PERFORMANCE
POLISHING
REFLECTION
SYNCHROTRONS
WAVELENGTHS