Multilayer dielectric diffraction gratings

Patent · Fri Jan 01 00:00:00 EST 1999

OSTI ID:872305

Perry, Michael D ^[1]; Britten, Jerald A ^[2]; Nguyen, Hoang T ^[1]; Boyd, Robert ^[1]; Shore, Bruce W ^[1]

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1. Livermore, CA
2. Oakley, CA

The design and fabrication of dielectric grating structures with high diffraction efficiency used in reflection or transmission is described. By forming a multilayer structure of alternating index dielectric materials and placing a grating structure on top of the multilayer, a diffraction grating of adjustable efficiency, and variable optical bandwidth can be obtained. Diffraction efficiency into the first order in reflection varying between 1 and 98 percent has been achieved by controlling the design of the multilayer and the depth, shape, and material comprising the grooves of the grating structure. Methods for fabricating these gratings without the use of ion etching techniques are described.

• Research Organization: Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)
• DOE Contract Number: W-7405-ENG-48
• Assignee: Regents of University of California (Oakland, CA)
• Patent Number(s): US 5907436
• OSTI ID: 872305
• Country of Publication: United States
• Language: English

Related Subjects

multilayer
dielectric
diffraction
gratings
design
fabrication
grating
structures
efficiency
reflection
transmission
described
forming
structure
alternating
index
materials
placing
top
adjustable
variable
optical
bandwidth
obtained
varying
98
percent
achieved
controlling
depth
shape
material
comprising
grooves
methods
fabricating
etching
techniques
multilayer dielectric
dielectric materials
material comprising
diffraction grating
dielectric material
multilayer structure
grating structure
etching techniques
diffraction gratings
diffraction efficiency
grating structures
optical band
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