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Title: Backgrounds and masking at the Tau-Charm Factory

Conference ·
OSTI ID:5898548

Preliminary results are presented for beam-related backgrounds in the Tau-Charm Factory detector. The Orsay flat-beam optics design was used in the simulations. Results with different masking schemes are compared for lost beam particle backgrounds.

Research Organization:
Stanford Linear Accelerator Center, Menlo Park, CA (United States)
Sponsoring Organization:
USDOE; USDOE, Washington, DC (United States)
DOE Contract Number:
AC03-76SF00515
OSTI ID:
5898548
Report Number(s):
SLAC-PUB-5660; CONF-9104310-2; ON: DE92006438
Resource Relation:
Conference: Tau-charm factor workshop, Andalucia (Spain), 29 Apr - 2 May 1991
Country of Publication:
United States
Language:
English