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Title: Study of elimination of vapor atom deposition. Final report

Technical Report ·
DOI:https://doi.org/10.2172/5718376· OSTI ID:5718376

The major objective of this study was to define and evaluate methods by which an optical system could be protected from performance degradation arising from exposure to a beam of heavy metal atoms. The optical system is coupled to a chamber in which the metal atoms are being produced and processed. The coupling aperture is the source of the contaminating metal atom beam, which, if un-attenuated, would degrade the system performance in an unacceptably short period of time. It was agreed early in the program to concentrate on a gaseous scattering technique, with a stated objective of metal beam flux reduction of about 10/sup 6/. Additional constraints require that the scattering gas must not effuse back into the main process chamber at such a rate that it has significant effect on the vacuum level in the chamber, which is of the order of 10/sup -6/ torr; finally, the path length between the main chamber and the optical system must not be increased unduly. This report summarizes the analyses that were performed under the program. Section 2 presents a summary review, while the details of the analyses are described in Section 3. Recommendations leading toward final system design are given in Section 4. Finally, an appendix contains a description and printout of a program that was developed and used to facilitate the evaluation of system performance parametrically. 6 refs., 9 figs.

Research Organization:
Arvin Calspan, Buffalo, NY (USA). Applied Technology Group
DOE Contract Number:
W-7405-ENG-48
OSTI ID:
5718376
Report Number(s):
UCRL-15478; ON: DE85012954
Resource Relation:
Other Information: Portions of this document are illegible in microfiche products. Calspan report No. 6911-A-3
Country of Publication:
United States
Language:
English