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Title: Drastic enhancement of magnetic critical temperature and amorphization in topological magnet EuSn2P2 under pressure

Journal Article · · npj Quantum Materials
ORCiD logo [1];  [1];  [1];  [2];  [3]; ORCiD logo [4];  [1];  [5]; ORCiD logo [6];  [5];  [7];  [7];  [5];  [1]
  1. Univ. of Alabama, Birmingham, AL (United States)
  2. Rutgers Univ., Piscataway, NJ (United States)
  3. National Cheng Kung Univ., Tainan (Taiwan)
  4. National Cheng Kung Univ., Tainan (Taiwan); Center for Quantum Frontiers of Research and Technology, Tainan (Taiwan); National Taiwan Univ., Taipei (Taiwan)
  5. Argonne National Lab. (ANL), Argonne, IL (United States)
  6. Argonne National Lab. (ANL), Argonne, IL (United States); Univ. of Chicago, IL (United States)
  7. Univ. of Hawaii at Manoa, Honolulu, HI (United States)

High pressure is an effective tool to induce exotic quantum phenomena in magnetic topological insulators by controlling the interplay of magnetic order and topological state. This work presents a comprehensive high-pressure study of the crystal structure and magnetic ground state up to 62 GPa in an intrinsic topological magnet EuSn2P2. With a combination of high resolution X-ray diffraction, 151Eu synchrotron Mössbauer spectroscopy, X-ray absorption spectroscopy, molecular orbital calculations, and electronic band structure calculations, it has been revealed that pressure drives EuSn2P2 from a rhombohedral crystal to an amorphous phase at 36 GPa accompanied by a fourfold enhancement of magnetic ordering temperature. In the pressure-induced amorphous phase, Eu ions take an intermediate valence state. The drastic enhancement of magnetic ordering temperature from 30 K at ambient pressure to 130 K at 41.2 GPa resulting from Ruderman–Kittel–Kasuya–Yosida (RKKY) interactions likely attributes to the stronger Eu–Sn interaction at high pressure. These rich results demonstrate that EuSn2P2 is an ideal platform to study the correlation of the enhanced RKKY interactions, disordered lattice, intermediate valence, and topological state.

Research Organization:
Rutgers Univ., Piscataway, NJ (United States); Argonne National Laboratory (ANL), Argonne, IL (United States). Advanced Photon Source (APS)
Sponsoring Organization:
USDOE Office of Science (SC), Basic Energy Sciences (BES). Scientific User Facilities Division; National Science Foundation (NSF); National Aeronautics and Space Administration (NASA); Graduate Assistantship in Areas of National Need (GAANN); USDOE National Nuclear Security Administration (NNSA)
Grant/Contract Number:
SC0022156; AC02-06CH11357; OIA-2033131; P200A180001
OSTI ID:
1865359
Alternate ID(s):
OSTI ID: 1901708
Journal Information:
npj Quantum Materials, Vol. 7, Issue 1; ISSN 2397-4648
Publisher:
Nature Publishing GroupCopyright Statement
Country of Publication:
United States
Language:
English

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