High-throughput phase-field simulations and machine learning of resistive switching in resistive random-access memory
- Univ. of Texas, Arlington, TX (United States). Dept. of Materials Science and Engineering
- Pennsylvania State Univ., University Park, PA (United States). Dept. of Materials Science and Engineering
- Zhejiang Univ., Hangzhou (China). School of Materials Science and Engineering. Cyrus Tang Center for Sensor Materials and Applications. State Key Lab. of Silicon Materials. Lab. of Dielectric Materials
- Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States). Center for Nanophase Materials Sciences (CNMS)
Metal oxide-based Resistive Random-Access Memory (RRAM) exhibits multiple resistance states, arising from the activation/deactivation of a conductive filament (CF) inside a switching layer. Understanding CF formation kinetics is critical to achieving optimal functionality of RRAM. Here a phase-field model is developed, based on materials properties determined by ab initio calculations, to investigate the role of electrical bias, heat transport and defect-induced Vegard strain in the resistive switching behavior, using MO2-x systems such as HfO2-x as a prototypical model system. It successfully captures the CF formation and resultant bipolar resistive switching characteristics. High-throughput simulations are performed for RRAMs with different material parameters to establish a dataset, based on which a compressed-sensing machine learning is conducted to derive interpretable analytical models for device performance (current on/off ratio and switching time) metrics in terms of key material parameters (electrical and thermal conductivities, Vegard strain coefficients). These analytical models reveal that optimal performance (i.e., high current on/off ratio and low switching time) can be achieved in materials with a low Lorenz number, a fundamental material constant. This work provides a fundamental understanding to the resistive switching in RRAM and demonstrates a computational data-driven methodology of materials selection for improved RRAM performance, which can also be applied to other electro-thermo-mechanical systems.
- Research Organization:
- Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States)
- Sponsoring Organization:
- USDOE Office of Science (SC), Basic Energy Sciences (BES); US Army Research Office (ARO); National Natural Science Foundation of China (NSFC)
- Grant/Contract Number:
- SC0020145; AC05-00OR22725; W911NF-17-1-0462; 51802280
- OSTI ID:
- 1787247
- Alternate ID(s):
- OSTI ID: 1818745
- Journal Information:
- npj Computational Materials, Vol. 6, Issue 1; ISSN 2057-3960
- Publisher:
- Nature Publishing GroupCopyright Statement
- Country of Publication:
- United States
- Language:
- English
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