Direct Write of 3D Nanoscale Mesh Objects with Platinum Precursor via Focused Helium Ion Beam Induced Deposition

Belianinov, Alex; Burch, Matthew J.; Ievlev, Anton; Kim, Songkil; Stanford, Michael G.; Mahady, Kyle; Lewis, Brett B.; Fowlkes, Jason Davidson; Rack, Philip D.; Ovchinnikova, Olga S.

doi:10.3390/mi11050527

Title: Direct Write of 3D Nanoscale Mesh Objects with Platinum Precursor via Focused Helium Ion Beam Induced Deposition

Journal Article · Fri May 22 00:00:00 EDT 2020 · Micromachines

DOI:https://doi.org/10.3390/mi11050527· OSTI ID:1735453

^[1];

^[2]; Stanford, Michael G. ^[3]; Mahady, Kyle ^[3]; Lewis, Brett B. ^[3];

^[4];

^[1]

Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States)
Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States); Pusan National Univ., Busan (Korea, Republic of)
Univ. of Tennessee, Knoxville, TN (United States)
Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States); Univ. of Tennessee, Knoxville, TN (United States)

The next generation optical, electronic, biological, and sensing devices as well as platforms will inevitably extend their architecture into the 3rd dimension to enhance functionality. In focused ion beam induced deposition (FIBID), a helium gas field ion source can be used with an organometallic precursor gas to fabricate nanoscale structures in 3D with high-precision and smaller critical dimensions than focused electron beam induced deposition (FEBID), traditional liquid metal source FIBID, or other additive manufacturing technology. In this work, we report the effect of beam current, dwell time, and pixel pitch on the resultant segment and angle growth for nanoscale 3D mesh objects. We note subtle beam heating effects, which impact the segment angle and the feature size. Additionally, we investigate the competition of material deposition and sputtering during the 3D FIBID process, with helium ion microscopy experiments and Monte Carlo simulations. Our results show complex 3D mesh structures measuring ~300 nm in the largest dimension, with individual features as small as 16 nm at full width half maximum (FWHM). These assemblies can be completed in minutes, with the underlying fabrication technology compatible with existing lithographic techniques, suggesting a higher-throughput pathway to integrating FIBID with established nanofabrication techniques.

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Research Organization:: Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States)

Sponsoring Organization:: USDOE Office of Science (SC), Basic Energy Sciences (BES)

Grant/Contract Number:: AC05-00OR22725; SC0002136

OSTI ID:: 1735453

Journal Information:: Micromachines, Vol. 11, Issue 5; ISSN 2072-666X

Publisher:: MDPICopyright Statement

Country of Publication:: United States

Language:: English

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