Thermoelectric La-doped SrTiO3 epitaxial layers with single-crystal quality: from nano to micrometers
- Inst. des Nanotechnologies de Lyon (INL) – CNRS, Ecully (France)
- Inst. Lumière Matière (ILM) - CNRS, Villeurbanne (France)
- Inst. des Nanotechnologies de Lyon (INL) – CNRS, Ecully (France); Inst. d’Electronique et des Systèmes (IES) - CNRS, Montpellier (France)
- Inst. de Ciencia de Materials de Barcelona (ICMAB -CSIC), Bellaterra (Spain)
High-quality thermoelectric La0.2Sr0.8TiO3 (LSTO) films, with thicknesses ranging from 20 nm to 0.7 μm, have been epitaxially grown on SrTiO3(001) substrates by enhanced solid-source oxide molecular-beam epitaxy. All films are atomically flat (with rms roughness < 0.2 nm), with low mosaicity (<0.1°), and present very low electrical resistivity (<5 × 10-4 Ω cm at room temperature), one order of magnitude lower than standard commercial Nb-doped SrTiO3 singlecrystalline substrate. The conservation of transport properties within this thickness range has been confirmed by thermoelectric measurements where Seebeck coefficients of approximately –60 μV/K have been recorded for all films. These LSTO films can be integrated on Si for nonvolatile memory structures or opto-microelectronic devices, functioning as transparent conductors or thermoelectric elements.
- Research Organization:
- Oak Ridge National Laboratory (ORNL), Oak Ridge, TN (United States)
- Sponsoring Organization:
- USDOE Office of Science (SC)
- Grant/Contract Number:
- AC05-00OR22725
- OSTI ID:
- 1625096
- Journal Information:
- Science and Technology of Advanced Materials, Vol. 18, Issue 1; ISSN 1468-6996
- Publisher:
- IOP PublishingCopyright Statement
- Country of Publication:
- United States
- Language:
- English
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