Beyond the conventional transistor
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journal
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March 2002 |
High dielectric constant gate oxides for metal oxide Si transistors
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journal
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December 2005 |
High-K materials and metal gates for CMOS applications
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journal
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February 2015 |
Characterization of hafnium oxide thin films prepared by electron beam evaporation
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journal
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March 2004 |
Chemical vapour deposition of the oxides of titanium, zirconium and hafnium for use as high-k materials in microelectronic devices. A carbon-free precursor for the synthesis of hafnium dioxide
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journal
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January 2000 |
Formation of a Bilayer of ALD-SiO2 and Sputtered Al2O3/ZrO2 Films on Polyethylene Terephthalate Substrates as a Moisture Barrier
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journal
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January 2013 |
Structural and optical properties of thin zirconium oxide films prepared by reactive direct current magnetron sputtering
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journal
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October 2002 |
Rapid thermal chemical vapor deposition of zirconium oxide for metal-oxide-semiconductor field effect transistor application
- Chang, Jane P.; Lin, You-Sheng; Chu, Karen
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Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 19, Issue 5
https://doi.org/10.1116/1.1396639
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journal
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January 2001 |
Chemical Vapor Deposition of Zirconium Oxide on Aerosolized Silicon Nanoparticles
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November 2006 |
Ultrathin HfO 2 gate dielectric grown by plasma-enhanced chemical vapor deposition using Hf[OC(CH 3 ) 3 ] 4 as a precursor in the absence of O 2
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journal
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January 2003 |
Plasma-enhanced chemical vapor deposition and characterization of high-permittivity hafnium and zirconium silicate films
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journal
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July 2002 |
Atomic layer deposition of hafnium oxide dielectrics on silicon and germanium substrates
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journal
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July 2007 |
Atomic layer deposition of hafnium oxide and hafnium silicate thin films using liquid precursors and ozone
- Senzaki, Yoshihide; Park, Seung; Chatham, Hood
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Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 22, Issue 4
https://doi.org/10.1116/1.1761186
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journal
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July 2004 |
Atomic Layer Deposition of Hafnium and Zirconium Oxides Using Metal Amide Precursors
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journal
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October 2002 |
Thin-Film Transistor Fabricated in Single-Crystalline Transparent Oxide Semiconductor
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journal
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May 2003 |
Crystal structure and band gap determination of HfO2 thin films
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journal
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March 2007 |
Textured crystallization of ultrathin hafnium oxide films on silicon substrate
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journal
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April 2007 |
Effects of crystallization on the electrical properties of ultrathin HfO2 dielectrics grown by atomic layer deposition
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journal
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January 2003 |
Plasma enhanced atomic layer deposition of HfO2 and ZrO2 high-k thin films
- Lao, Sandy X.; Martin, Ryan M.; Chang, Jane P.
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Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 23, Issue 3
https://doi.org/10.1116/1.1894666
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journal
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May 2005 |
Effects of Ar Addition to O 2 Plasma on Plasma-Enhanced Atomic Layer Deposition of Oxide Thin Films
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journal
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October 2018 |
Deposition of hard metal nitride-like coatings in an electron cyclotron resonance discharge
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journal
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January 2004 |
Plasma-assisted growth of bilayer silicon-containing coatings for hardness and corrosion resistance
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journal
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July 2004 |
Robust and inexpensive thermal vaporizer for low-vapor pressure liquids
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journal
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August 2003 |
Atomic Layer Deposition: An Overview
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journal
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January 2010 |
Atomic layer deposition of perovskite oxides and their epitaxial integration with Si, Ge, and other semiconductors
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journal
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December 2015 |
Structural and optical characterization of low-temperature ALD crystalline AlN
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journal
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July 2015 |
A brief review of atomic layer deposition: from fundamentals to applications
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journal
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June 2014 |
Plasma-Assisted Atomic Layer Deposition: Basics, Opportunities, and Challenges
- Profijt, H. B.; Potts, S. E.; van de Sanden, M. C. M.
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Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 29, Issue 5
https://doi.org/10.1116/1.3609974
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journal
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September 2011 |
Low-temperature remote plasma-enhanced atomic layer deposition of graphene and characterization of its atomic-level structure
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journal
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January 2014 |
High performance ring oscillators from 10-nm wide silicon nanowire field-effect transistors
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journal
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June 2011 |
Integrated Circuits Based on Bilayer MoS2 Transistors
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journal
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January 2012 |
Electron-beam-evaporated thin films of hafnium dioxide for fabricating electronic devices
- Xiao, Zhigang; Kisslinger, Kim
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Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena, Vol. 33, Issue 4
https://doi.org/10.1116/1.4922627
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journal
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July 2015 |
Investigation of HfO2 Thin Films on Si by X-ray Photoelectron Spectroscopy, Rutherford Backscattering, Grazing Incidence X-ray Diffraction and Variable Angle Spectroscopic Ellipsometry
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journal
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June 2018 |
Molecular dynamics study of the growth of crystalline ZrO2
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journal
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October 2016 |
Characterization of e-beam evaporated hafnium oxide thin films on post thermal annealing
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journal
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October 2013 |
Study of the structure and optical properties of nanocrystalline zirconium oxide thin films deposited at low temperatures
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journal
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May 2004 |
High-rate reactive high-power impulse magnetron sputtering of hard and optically transparent HfO 2 films
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journal
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March 2016 |
Benefits of the controlled reactive high-power impulse magnetron sputtering of stoichiometric ZrO2 films
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journal
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April 2015 |
Optical characterization of hafnium oxide thin films for heat mirrors
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journal
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April 2015 |
Comparative study of dielectric coating materials for micro-cavity applications
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journal
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January 2019 |
Beyond the conventional transistor
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journal
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May 2005 |