A new silicon phase with direct band gap and novel optoelectronic properties
- Peking Univ., Beijing (China); Key Lab. of High Energy Density Physics Simulation, and IFSA Collaborative Innovation Center, Ministry of Education, Beijing (China)
- Peking Univ., Beijing (China); Key Lab. of High Energy Density Physics Simulation, and IFSA Collaborative Innovation Center, Ministry of Education, Beijing (China); Virginia Commonwealth Univ., Richmond, VA (United States)
- Tohoku Univ., Sendai (Japan); Kutateladze Institute of Thermophysics, Novosibirsk (Russia)
- Virginia Commonwealth Univ., Richmond, VA (United States)
Due to the compatibility with the well-developed Si-based semiconductor industry, there is considerable interest in developing silicon structures with direct energy band gaps for effective sunlight harvesting. In this paper, using silicon triangles as the building block, we propose a new silicon allotrope with a direct band gap of 0.61 eV, which is dynamically, thermally and mechanically stable. Symmetry group analysis further suggests that dipole transition at the direct band gap is allowed. Additionally, this new allotrope displays large carrier mobility (~104 cm/V · s) at room temperature and a low mass density (1.71 g/cm3), making it a promising material for optoelectronic applications.
- Research Organization:
- Virginia Commonwealth Univ., Richmond, VA (United States)
- Sponsoring Organization:
- USDOE Office of Science (SC), Basic Energy Sciences (BES)
- Grant/Contract Number:
- FG02-96ER45579
- OSTI ID:
- 1324969
- Journal Information:
- Scientific Reports, Vol. 5; ISSN 2045-2322
- Publisher:
- Nature Publishing GroupCopyright Statement
- Country of Publication:
- United States
- Language:
- English
Cited by: 73 works
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