Integration of Block-Copolymer with Nano-Imprint Lithography: Pushing the Boundaries of Emerging Nano-Patterning Technology.

Conference · Sat Oct 01 00:00:00 EDT 2011

OSTI ID:1120202

Brennecka, Geoffrey L.; George, Matthew C; Burckel, David Bruce; Skinner, Jack L.; Yang, Chu-Yeu Peter; Steinhaus, Charles A.; Allendorf, Sarah W.; Brueck, Steven R.J.; Raub, Alex; Nealey, Paul F.; de Pablo, Juan J.; Williamson, Lance; Peters, Brandon L.

Abstract not provided.

• Research Organization: Sandia National Lab. (SNL-NM), Albuquerque, NM (United States); Sandia National Lab. (SNL-CA), Livermore, CA (United States)
• Sponsoring Organization: USDOE National Nuclear Security Administration (NNSA)
• DOE Contract Number: AC04-94AL85000
• OSTI ID: 1120202
• Report Number(s): SAND2011-7429C; 482190
• Resource Relation: Conference: Proposed for presentation at the NINE meeting held July 26, 2011 in Albuquerque, NM.
• Country of Publication: United States
• Language: English