Micromachined stylus ion traps through high aspect ratio lithography and electrochemical deposition.
Conference
·
OSTI ID:1116065
Abstract not provided.
- Research Organization:
- Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)
- Sponsoring Organization:
- USDOE National Nuclear Security Administration (NNSA)
- DOE Contract Number:
- AC04-94AL85000
- OSTI ID:
- 1116065
- Report Number(s):
- SAND2013-2587C; 480131
- Resource Relation:
- Conference: Proposed for presentation at the High-Aspect-Ratio Micro-Structure Technology held April 21-24, 2013 in Berlin, Germany.
- Country of Publication:
- United States
- Language:
- English
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