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Title: Amorphous semiconducting and conducting transparent metal oxide thin films and production thereof

Patent ·
OSTI ID:1013008

Metal oxide thin films and production thereof are disclosed. An exemplary method of producing a metal oxide thin film may comprise introducing at least two metallic elements and oxygen into a process chamber to form a metal oxide. The method may also comprise depositing the metal oxide on a substrate in the process chamber. The method may also comprise simultaneously controlling a ratio of the at least two metallic elements and a stoichiometry of the oxygen during deposition. Exemplary amorphous metal oxide thin films produced according to the methods herein may exhibit highly transparent properties, highly conductive properties, and/or other opto-electronic properties.

Research Organization:
Alliance for Sustainable Energy, LLC (Golden, CO)
Sponsoring Organization:
USDOE
DOE Contract Number:
AC36-99GO10337
Assignee:
Alliance for Sustainable Energy, LLC (Golden, CO)
Patent Number(s):
7,754,352
Application Number:
11/738,344
OSTI ID:
1013008
Country of Publication:
United States
Language:
English

References (8)

Effects of introduction of argon on structural and transparent conducting properties of ZnO–In2O3 thin films prepared by pulsed laser deposition journal August 2005
Studies on preparation and characterization of indium doped zinc oxide films by chemical spray deposition journal August 2005
Highly transparent and conductive ZnOIn2O3 thin films prepared by d.c. magnetron sputtering journal December 1996
Physics of very thin ITO conducting films with high transparency prepared by DC magnetron sputtering journal December 1995
Systematic study and performance optimization of transparent conducting indium–zinc oxides thin films journal April 2001
Characterization of indium zinc oxide thin films prepared by pulsed laser deposition using a Zn3In2O6 target journal February 2000
The electrical, optical and structural properties of In x Zn 1− x O y (0  x  1) thin films by combinatorial techniques journal December 2004
Preparation of transparent conducting Zn2In2O5 films by d.c. magnetron sputtering journal April 1998

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