skip to main content
OSTI.GOV title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: Control of photoluminescence from porous silicon

Conference ·
OSTI ID:5831957

Visible light emission from silicon has until recently been thought to be negligible. Although hydrogenated amorphous Si (1) and polysilane based alloys (2) had been known to emit light, crystalline Si has an indirect bandgap which allows only for phonon-assisted radiative bandgap-transitions which are highly inefficient and produce light outside the visible range ({approx} 400 to 800 nm). Current work on porous Si (3) and thin films of Si (4) microcrystallites (2--5 nm diameter) have demonstrated photoluminescence (PL) from infra-red to green. In order to make this new physical phenomenon compatible with conventional integrated circuit technology, a method is needed to control and pattern light emitting regions of this Si-based material. This paper will demonstrate the use of ion irradiation to controllably reduce the emission of red light from porous silicon. In addition, the behavior of the PL intensity at room temperature as a function of incident-light energy and intensity will be examined. Finally, the effects on PL of annealing treatments to recover ion-beam change will be discussed.

Research Organization:
Sandia National Labs., Albuquerque, NM (United States)
Sponsoring Organization:
USDOE; USDOE, Washington, DC (United States)
DOE Contract Number:
AC04-76DP00789
OSTI ID:
5831957
Report Number(s):
SAND-91-2878C; CONF-920188-1; ON: DE92008020
Resource Relation:
Conference: 1992 workshop on atoms and clusters, Atami (Japan), 8-10 Jan 1992
Country of Publication:
United States
Language:
English

Similar Records

Control of photoluminescence from porous silicon
Conference · Tue Dec 31 00:00:00 EST 1991 · OSTI ID:5831957

Ion-irradiation control of photoluminescence from porous silicon
Journal Article · Mon Oct 21 00:00:00 EDT 1991 · Applied Physics Letters; (United States) · OSTI ID:5831957

Photoluminescence properties of SrAl{sub 2}O{sub 4}:Eu{sup 2+},Dy{sup 3+} thin phosphor films grown by pulsed laser deposition
Journal Article · Thu Jul 15 00:00:00 EDT 2010 · Journal of Vacuum Science and Technology. A, International Journal Devoted to Vacuum, Surfaces, and Films · OSTI ID:5831957