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Title: The Role of Anti-Phase Domains in InSb-Based Structures Grown on On-Axis and Off-Axis Ge Substrates

Journal Article · · AIP Conference Proceedings
DOI:https://doi.org/10.1063/1.3671719· OSTI ID:22004013
; ;  [1]; ;  [2]
  1. Homer L. Dodge Department of Physics and Astronomy, University of Oklahoma, Norman, OK 73019 (United States)
  2. Amethyst Research, Inc., 1405 4th Ave NW, Ardmore, OK 73401 (United States)

Anti-phase domains form in InSb epilayers and InSb/Al{sub 0.20}In{sub 0.80}Sb single quantum wells when grown upon on-axis (001) Ge substrates by molecular beam epitaxy. Domain formation is partially suppressed through growth on Ge substrates with surfaces that are several degrees off the (001) or (211) axis. By using off-axis Ge substrates, room-temperature electron mobilities increased to {approx}60,000 cm{sup 2}/V-s and {approx}14,000 cm{sup 2}/V-s for a 4.0-{mu}m-thick InSb epilayer and a 25-nm InSb quantum well, respectively.

OSTI ID:
22004013
Journal Information:
AIP Conference Proceedings, Vol. 1416, Issue 1; Conference: NGS15: 15. international conference on narrow gap systems, Blacksburg, VA (United States), 1-5 Aug 2011; Other Information: (c) 2011 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0094-243X
Country of Publication:
United States
Language:
English