Atomic layer-by-layer epitaxy of cuprate superconductors

Journal Article · Tue Mar 01 00:00:00 EST 1994 · Journal of Vacuum Science and Technology. B, Microelectronics Processing and Phenomena

DOI:https://doi.org/10.1116/1.587076· OSTI ID:136252

Bozovic, I; Eckstein, J N; Virshup, G F ^[1]

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1. Varian Associates, Inc., Palo Alto, CA (United States)

A technique for atomic layer-by-layer epitaxy of cuprate superconductors and other complex oxides has been developed at Varian. The samples are engineered by stacking molecular layers of different compounds to assemble multilayers and superlattices, by adding or omitting atomic monolayers to create novel compounds, and by doping within specified atomic monolayers. Apart form manufacturing trilayer Josephson junctions with I{sub c}R{sub n}>5 mV, this technique enables one to address fundamental issues such as the dimensionality of HTSC state, existence of long-range proximity effects, occurrence of resonant tunneling etc., as well as to synthesize novel metastable HTSC compounds. 4 refs., 2 figs.

• OSTI ID: 136252
• Journal Information: Journal of Vacuum Science and Technology. B, Microelectronics Processing and Phenomena, Vol. 12, Issue 2; Other Information: PBD: Mar-Apr 1994
• Country of Publication: United States
• Language: English

Related Subjects

66 PHYSICS
36 MATERIALS SCIENCE
HIGH-TC SUPERCONDUCTORS
EPITAXY
COPPER OXIDES
TEMPERATURE DEPENDENCE
X-RAY DIFFRACTION
JOSEPHSON JUNCTIONS
BISMUTH COMPOUNDS
STRONTIUM COMPOUNDS
CALCIUM COMPOUNDS