Mitigation of substrate defects in reflective reticles using sequential coating and annealing
Abstract
A buffer-layer to minimize the size of defects on a reticle substrate prior to deposition of a reflective coating on the substrate. The buffer-layer is formed by either a multilayer deposited on the substrate or by a plurality of sequentially deposited and annealed coatings deposited on the substrate. The plurality of sequentially deposited and annealed coating may comprise multilayer and single layer coatings. The multilayer deposited and annealed buffer layer coatings may be of the same or different material than the reflecting coating thereafter deposited on the buffer-layer.
- Inventors:
-
- Sunol, CA
- Issue Date:
- Research Org.:
- Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)
- OSTI Identifier:
- 874914
- Patent Number(s):
- 6489066
- Assignee:
- The Regents of the University of California (Oakland, CA)
- Patent Classifications (CPCs):
-
B - PERFORMING OPERATIONS B82 - NANOTECHNOLOGY B82Y - SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES
G - PHYSICS G03 - PHOTOGRAPHY G03F - PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES
- DOE Contract Number:
- W-7405-ENG-48
- Resource Type:
- Patent
- Country of Publication:
- United States
- Language:
- English
- Subject:
- mitigation; substrate; defects; reflective; reticles; sequential; coating; annealing; buffer-layer; minimize; size; reticle; prior; deposition; formed; multilayer; deposited; plurality; sequentially; annealed; coatings; single; layer; buffer; material; reflecting; thereafter; buffer layer; single layer; reflective coating; substrate prior; /430/378/
Citation Formats
Mirkanimi, Paul B. Mitigation of substrate defects in reflective reticles using sequential coating and annealing. United States: N. p., 2002.
Web.
Mirkanimi, Paul B. Mitigation of substrate defects in reflective reticles using sequential coating and annealing. United States.
Mirkanimi, Paul B. Tue .
"Mitigation of substrate defects in reflective reticles using sequential coating and annealing". United States. https://www.osti.gov/servlets/purl/874914.
@article{osti_874914,
title = {Mitigation of substrate defects in reflective reticles using sequential coating and annealing},
author = {Mirkanimi, Paul B},
abstractNote = {A buffer-layer to minimize the size of defects on a reticle substrate prior to deposition of a reflective coating on the substrate. The buffer-layer is formed by either a multilayer deposited on the substrate or by a plurality of sequentially deposited and annealed coatings deposited on the substrate. The plurality of sequentially deposited and annealed coating may comprise multilayer and single layer coatings. The multilayer deposited and annealed buffer layer coatings may be of the same or different material than the reflecting coating thereafter deposited on the buffer-layer.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Tue Jan 01 00:00:00 EST 2002},
month = {Tue Jan 01 00:00:00 EST 2002}
}
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